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Insulating Behavior in Ultrathin Bismuth Selenide Field Effect Transistors

  作者 Cho, SJ; Butch, NP; Paglione, J; Fuhrer, MS  
  选自 期刊  Nano Letters;  卷期  2011年11-5;  页码  1925-1927  
  关联知识点  
 

[摘要]Ultrathin (approximately three quintuple layer) field-effect transistors (FETs) of topological insulator Bi2Se3 are prepared by mechanical exfoliation on 300 nm SiO2/Si susbtrates. Temperature- and gate-voltage-dependent conductance measurements show that ultrathin Bi2Se3 FETs are n-type and have a clear OFF state at negative gate voltage, with activated temperature-dependent conductance and energy barriers up to 250 meV.

 
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