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Fabrication of poly-Si films by continuous local thermal chemical vapor deposition on flexible quartz glass substrate - art. no. 241503

  作者 Nakamura, T; Kuraseko, H; Hanazawa, K; Koaizawa, H; Uraoka, Y; Fuyuki, T; Mimura, A  
  选自 期刊  Applied Physics Letters;  卷期  2008年93-24;  页码  41503-41503  
  关联知识点  
 

[摘要]The continuous deposition of polycrystalline silicon film on quartz fiber by local thermal chemical deposition was investigated. High-speed deposition owing to high temperature and locality was examined using fixed and moving substrates. We confirmed the

 
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