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Mechanophotopatterning on a Photoresponsive Elastomer

  作者 Kloxin, CJ; Scott, TF; Park, HY; Bowman, CN  
  选自 期刊  ADVANCED MATERIALS;  卷期  2011年23-17;  页码  1977-1981  
  关联知识点  
 

[摘要]Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.

 
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