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Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers

  作者 Alvarez, M; Best, A; Unger, A; Alonso, JM; del Campo, A; Schmelzeisen, M; Koynov, K; Kreiter, M  
  选自 期刊  ADVANCED FUNCTIONAL MATERIALS;  卷期  2010年20-24;  页码  4265-4272  
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[摘要]We prove that the enhanced electromagnetic near-field around metallic nanostructures can be used for localized two-photon-induced activation of surfaces, obtaining a defined chemical pattern with nanometric resolution. Gold nanoparticles (Au-NP) are deposited on glass slides that were modified with a polysiloxane layer containing a nitroveratrylcarbonyl (NVoc) photoremovable group. Upon illumination with a femtosecond laser, the NVoc entity is removed. Due to the electromagnetic field enhancement of the nanoparticles, the threshold of this process is lowered in the nm-scale vicinity of the metal structures. Upon cleavage, an amine functional group is released, which can be used to site-selectively bind species with complementary chemical functionality on the surface. This method can be utilized for sub-wavelength chemical structuring.

 
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