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Thickness dependence on crystalline structure and interfacial reactions in HfO2 films on InP (001) grown by atomic layer deposition

  作者 Kang, YS; Kim, CY; Cho, MH; Chung, KB; An, CH; Kim, H; Lee, HJ; Kim, CS; Lee, TG  
  选自 期刊  Applied Physics Letters;  卷期  2010年97-17;  页码  172108-172108  
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[摘要]The crystalline structure and interfacial reactions in HfO2 films grown on InP (001) substrates was investigated as a function of film thickness. High resolution transmission electron microscopy and x-ray diffraction measurements were used to investigate

 
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