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Reduction in surface recombination and enhancement of light emission in silicon photonic crystals treated by high-pressure water-vapor annealing

  作者 Fujita, M; Gelloz, B; Koshida, N; Noda, S  
  选自 期刊  Applied Physics Letters;  卷期  2010年97-12;  页码  121111-121111  
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[摘要]We propose and demonstrate the application of high-pressure water-vapor annealing (HWA) to silicon photonic crystals for surface passivation. We find that the photoluminescence intensity from a sample treated with HWA is enhanced by a factor of similar to

 
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