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Aryl Functionalization as a Route to Band Gap Engineering in Single Layer Graphene Devices

  作者 Zhang, H; Bekyarova, E; Huang, JW; Zhao, Z; Bao, WZ; Wang, FL; Haddon, RC; Lau, CN  
  选自 期刊  Nano Letters;  卷期  2011年11-10;  页码  4047-4051  
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[摘要]Chemical functionalization is a promising route to band gap engineering of graphene. We chemically grafted nitrophenyl groups onto exfoliated single-layer graphene sheets in the form of substrate-supported or free-standing films. Our transport measurements demonstrate that nonsuspended functionalized graphene behaves as a granular metal, with variable range hopping transport and a mobility gap similar to 0.1 eV at low temperature. For suspended graphene that allows functionaliza-tion on both surfaces, we demonstrate tuning of its electronic properties from a granular metal to a semiconductor in which transport occurs via thermal activation over a transport gap similar to 80 meV from 4 to 300 K. This noninvasive and scalable functionalization technique paves the way for CMOS-compatible band gap engineering of graphene electronic devices.

 
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