个性化文献订阅>期刊> Applied Physics Letters
 

Transport properties of gallium nitride nanowire metal-oxide-semiconductor transistor - art. no. 152108

  作者 Yu, JW; Li, CK; Chen, CY; Wu, YR; Chou, LJ; Peng, LH  
  选自 期刊  Applied Physics Letters;  卷期  2011年99-15;  页码  52108-52108  
  关联知识点  
 

[摘要]We investigated the transport properties of [11 (2) over bar0]-gallium nitride (GaN)/gallium oxide (Ga2O3) single nanowire metal-oxide-semiconductor field-effect-transistor grown on (0001) sapphire substrates. With 0.1 mu m gate-length and 60 nm wire-size, the device exhibits maximum transconductance of 85 mu S, saturation current of 105 mu A, and unity current gain bandwidth f(t) at 95 GHz. From a three-dimensional (3D) diffusion-and-drift model analysis, polarization-induced negative space charge of -3 x 10(12) cm(-2) at the back interface of GaN/sapphire, positive space charge of 7 x 10(12) cm(-2) at the inclined semi-polar {1 (1) over bar0 (1) over bar} GaN/Ga2O3 interfaces with screening by two-dimensional electron gas to keep charge neutrality were found responsible for the high-speed transport Characteristics. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3651332]

 
      被申请数(0)  
 

[全文传递流程]

一般上传文献全文的时限在1个工作日内