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Impact of << 110 >> uniaxial strain on n-channel In0.15Ga0.85As high electron mobility transistors

  作者 Xia, L; del Alamo, JA  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-24;  页码  243504-243504  
  关联知识点  
 

[摘要]This letter reports on a study of the impact of << 110 >> uniaxial strain on the characteristics of InGaAs high electron mobility transistors (HEMT) by bending GaAs chips up to a strain level of 0.4%. Systematic changes in the threshold voltage and intrin

 
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