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Effect of channel widths on negative shift of threshold voltage, including stress-induced hump phenomenon in InGaZnO thin-film transistors under high-gate and drain bias stress - art. no. 043503

  作者 Choi, SH; Han, MK  
  选自 期刊  Applied Physics Letters;  卷期  2012年100-4;  页码  43503-43503  
  关联知识点  
 

[摘要]We investigated the degradation of indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs) for various channel widths under high-gate and drain bias stress. The threshold voltage of IGZO TFT with wide-channel width (W > 100 mu m) was significantly s

 
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