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Photon energy threshold for filling boron induced charge traps in SiO2 near the Si/SiO2 interface using second harmonic generation

  作者 Park, H; Xu, Y; Varga, K; Qi, JB; Feldman, LC; Lupke, G; Tolk, N  
  选自 期刊  Applied Physics Letters;  卷期  2010年97-20;  页码  202105-202105  
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[摘要]We report the experimental determination of the threshold energy for filling the B+ induced charge traps in SiO2 near the Si/SiO2 interface, using a two-color pump-probe approach involving internal photoemission and second harmonic generation. The thresho

 
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