Macroscopic and microscopic electrical characterizations of high-k ZrO2 and ZrO2/Al2O3/ZrO2 metal-insulator-metal structures - art. no. 01AC02

[摘要]：In order for sub-10 nm thin films of ZrO2 to have a dielectric constant larger than 30 they need to be crystalline. This is done by either depositing the layer at higher temperatures or by a postdeposition annealing step. Both methods induce high leakage

[全文传递流程]：

一般上传文献全文的时限在1个工作日内