| |
[摘要]：CoPt microstructures, in the form of both discontinuous layers and patterned arrays, of 60-70 wt% Pt and nanometric thickness have been grown by electrodeposition through a resist mask prepared directly onto a glass/ITO substrate. This substrate was selected because its conductive ITO layer permits the electrodeposition process but does not show magnetic response. The lack of magnetic response of the substrate enables the magnetic properties of the microstructures deposited over it to be measured directly. Test microstructures of the different aspect ratio were successfully prepared, which confirms the suitability of the used bath; a good definition of both has been attained in spite of the significant hydrogen co-evolution. The deposition conditions have been adjusted to obtain a highly distorted hcp crystalline structure. Differences in the magnetic behaviour of the microstructures were observed depending on the orientations of the magnetic field applied. This work demonstrates the capability of the electrodeposition method to grow well-defined nanometric thick microstructures of hcp magnetic CoPt alloy with modulable magnetic properties as a function of the orientation of the applied magnetic field, microstructures which could be directly incorporated in magnetic microelectromechanical systems. |
|
