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Coexistence of bi-stable memory and mono-stable threshold resistance switching phenomena in amorphous NbOx films - art. no. 062902

  作者 Bae, J; Hwang, I; Jeong, Y; Kang, SO; Hong, S; Son, J; Choi, J; Kim, J; Park, J; Seong, MJ; Jia, QX; Park, BH  
  选自 期刊  Applied Physics Letters;  卷期  2012年100-6;  页码  62902-62902  
  关联知识点  
 

[摘要]Both bi-stable memory and mono-stable threshold switching are observed in amorphous NbOx films. In addition, the transition between memory and threshold switching can be induced by changing external electrical stress. Raman spectroscopy and transmission e

 
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