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Effect of carbon contamination on the printing performance of extreme ultraviolet masks

  作者 Fan, YJ; Yankulin, L; Antohe, A; Thomas, P; Mbanaso, C; Garg, R; Wang, YF; Wust, A; Goodwin, F; Huh, S; Naulleau, P; Goldberg, K; Mochi, I; Denbeaux, G  
  选自 期刊  Journal Of Vacuum Science & Technology B;  卷期  2010年28-2;  页码  321-328  
  关联知识点  
 

[摘要]Carbon contamination is a significant issue with extreme ultraviolet (EUV) masks because it lowers throughput and has potential effects on imaging performance. Current carbon contamination research is primarily focused on the lifetime of the multilayer su

 
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