| |
[摘要]：We have developed a transparent, non-sticky silicate nano mold with high mechanical strength and excellent releasing properties through a simple phase conversion process of polyvinylsilazane (PVSZ) replica mold. This inexpensive inorganic polymer derived silicate mold does not require extra surface modification and could be used as an ideal mold with low adhesion force for nanoimprint lithographic applications. The silicate hard nano mold allows fabrication of sub-100 nm patterns down to 30 nm. The mold can be used for both UV and thermal NIL duplication processes in a repeated manner. The economic efficiency of the mold fabrication as well as the high durability and excellent releasing properties could be quite valuable to physical contact nanolithography for high-throughput fabrication of nano-devices. |
|
