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Impact of Sn/Zn ratio on the gate bias and temperature-induced instability of Zn-In-Sn-O thin film transistors

  作者 Ryu, MK; Yang, S; Park, SHK; Hwang, CS; Jeong, JK  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-17;  页码  173508-173508  
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[摘要]We investigated the effect of the Sn/Zn ratio in the amorphous Zn-In-Sn-O (ZITO) system on the gate voltage stress-induced stability of the resulting thin film transistors (TFTs). The device stability of the TFTs with a composition channel of Zn: In: Sn=0

 
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