- Spatial-carrier phase-shifting digital holography utilizing spatial frequency analysis for the correction of the phase-shift error
[作者:Tahara, T; Shimozato, Y; Awatsuji, Y; Nishio, K; Ura, S; Matoba, O; Kubota, T,期刊:OPTICS LETTERS, 页码:148-150 , 文章类型: Article,,卷期:2012年37-2]
- We propose a single-shot digital holography in which the complex amplitude distribution is obtained by spatial-carrier phase-shifting (SCPS) interferometry and the correction of the inherent phase-shift error occurred in...
- Phase correlations and optical coherence
[作者:Tervo, J; Setala, T; Friberg, AT,期刊:OPTICS LETTERS, 页码:151-153 , 文章类型: Article,,卷期:2012年37-2]
- We examine the properties of the recently introduced degrees of coherence regarding the phase correlations of the optical field. It is seen that some of these quantities are straightforwardly related to the limits of com...
- Experimental demonstration of terahertz metamaterial absorbers with a broad and flat high absorption band
[作者:Huang, L; Chowdhury, DR; Ramani, S; Reiten, MT; Luo, SN; Taylor, AJ; Chen, HT,期刊:OPTICS LETTERS, 页码:154-156 , 文章类型: Article,,卷期:2012年37-2]
- We present the design, numerical simulations and experimental measurements of terahertz metamaterial absorbers with a broad and flat absorption top over a wide incidence angle range for either transverse electric or tran...
- Plasmonic properties of aluminum nanorings generated by double patterning
[作者:Lehr, D; Dietrich, K; Helgert, C; Kasebier, T; Fuchs, HJ; Tunnermann, A; Kley, EB,期刊:OPTICS LETTERS, 页码:157-159 , 文章类型: Article,,卷期:2012年37-2]
- In this Letter we evaluate a technique for the efficient and flexible generation of aluminum nanorings based on double patterning and variable shaped electron beam lithography. The process is demonstrated by realizing na...
- Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection
[作者:van den Boogaard, AJR; van Goor, FA; Louis, E; Bijkerk, F,期刊:OPTICS LETTERS, 页码:160-162 , 文章类型: Article,,卷期:2012年37-2]
- A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, lambda = 13.5 nm) reflectance values up to 64% are demonstrated, ...
|