- Spatial dose control for fabrication of saw-tooth structures
[作者:Lee, SY; Jeon, SC; Kim, JS; Kim, KN; Hyun, MS; Yoo, JJ; Kim, JW,期刊:Journal Of Vacuum Science & Technology B, 页码:2580-2584 , 文章类型: Article,,卷期:2009年27-6]
- Electron-beam (e-beam) lithography is often employed in the fabrication of three-dimensional structures, i.e., e-beam grayscale lithography where dose is spatially controlled such that the remaining resist profile is as ...
- Application of neural network to controlling three-dimensional electron-beam exposure distribution in resist
[作者:Guo, C; Lee, SY; Lee, SH; Kim, BG; Cho, HK,期刊:Journal Of Vacuum Science & Technology B, 页码:2572-2579 , 文章类型: Article,,卷期:2009年27-6]
- Electron-beam (e-beam) lithography is often employed for the fabrication of binary patterns with nanoscale features and grayscale structures. In such applications, exposure distribution along the depth dimension of the r...
- Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography
[作者:Kratschmer, E; Klaus, DP; Viswanathan, R; Turnidge, ML; Reed, PL; McPhail, B,期刊:Journal Of Vacuum Science & Technology B, 页码:2563-2568 , 文章类型: Article,,卷期:2009年27-6]
- Shape locate mark registration, a novel image processing technique to accurately locate even damaged registration marks, has been used to resolve alignment challenges in aggressively scaled lithography levels for sub-32 ...
- Robust, efficient grating couplers for planar optical waveguides using no-photoacid generator SU-8 electron beam lithography
[作者:Bross, AL; Lafyatis, G; Ayachitula, R; Morss, A; Hardman, R; Golden, J,期刊:Journal Of Vacuum Science & Technology B, 页码:2602-2605 , 文章类型: Article,,卷期:2009年27-6]
- 450 nm pitch coupling gratings with greater than 10% input coupling efficiency have been fabricated on thin film planar optical waveguides using electron beam lithography on a novel SU-8 resist formulation that contains ...
- Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV
[作者:Rio, D; Constancias, C; Saied, M; Icard, B; Pain, L,期刊:Journal Of Vacuum Science & Technology B, 页码:2512-2517 , 文章类型: Article,,卷期:2009年27-6]
- Electrical characteristics of devices depend on the line edge roughness (LER). LER contributes to the off-state leakage budget and short-channel effect. Therefore, it has to be controlled during the lithography step sinc...
|