- High-optical-quality nanosphere lithographically formed InGaAs quantum dots using molecular beam epitaxy assisted GaAs mass transport and overgrowth
[作者:Qian, XF; Vangala, S; Wasserman, D; Goodhue, WD,期刊:Journal Of Vacuum Science & Technology B, 页码:648-648 , 文章类型: Proceedings Paper,,卷期:2010年28-3]
- Optically active, highly uniform, cylindrical InGaAs quantum dot (QD) arrays have been fabricated using nanosphere lithography combined with Bromine ion-beam-assisted etching and molecular beam epitaxy (MBE)-assisted GaA...
- Measurement of the Casimir effect under ultrahigh vacuum: Calibration method
[作者:Torricelli, G; Thornton, S; Binns, C; Pirozhenko, I; Lambrecht, A,期刊:Journal Of Vacuum Science & Technology B, 页码:648-648 , 文章类型: Article,,卷期:2010年28-3]
- In this article, the authors present a strategy to measure the Casimir effect with an atomic force microscopy in an ultrahigh vacuum system. The key parameters including the absolute distance, the contact potential diffe...
- Passivation of InGaAs using in situ molecular beam epitaxy Al2O3/HfO2 and HfAlO/HfO2
[作者:Chang, P; Lee, WC; Huang, ML; Lee, YJ; Hong, M; Kwo, J,期刊:Journal Of Vacuum Science & Technology B, 页码:648-648 , 文章类型: Proceedings Paper,,卷期:2010年28-3]
- In0.2Ga0.8As was effectively passivated using in situ molecular beam epitaxy deposited Al2O3/HfO2 and HfO2-Al2O3(HfAlO)/HfO2. HfO2 3 ML (monolayer) thick was epitaxially grown on InGaAs, as monitored by reflection high-e...
- Development of ion sources from ionic liquids for microfabrication
[作者:Perez-Martinez, C; Guilet, S; Gogneau, N; Jegou, P; Gierak, J; Lozano, P,期刊:Journal Of Vacuum Science & Technology B, 页码:L25-L27 , 文章类型: Article,,卷期:2010年28-3]
- In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid EMI-BF...
- Method to obtain nonuniformity information from field emission behavior
[作者:Dall'Agnol, FF; de Paulo, AC; Paredez, P; den Engelsen, D; Santos, TEA; Mammana, VP,期刊:Journal Of Vacuum Science & Technology B, 页码:441-449 , 文章类型: Article,,卷期:2010年28-3]
- This article describes the characterization of field emission from a planar cathode to a spherical anode with the approach curve method (ACM). In such a diode configuration the electric field strength at the cathode surf...
- Effect of energetic ions on plasma damage of porous SiCOH low-k materials
[作者:Kunnen, E; Baklanov, MR; Franquet, A; Shamiryan, D; Rakhimova, TV; Urbanowicz, AM; Struyf, H; Boullart, W,期刊:Journal Of Vacuum Science & Technology B, 页码:450-459 , 文章类型: Article,,卷期:2010年28-3]
- Plasma damage of SiCOH low-k films in an oxygen plasma is studied using a transformer coupled plasma reactor. The concentration of oxygen atoms and O-2(+) ions is varied by using three different conditions: (1) bottom po...
- Effects of AlxGa1-xN interlayer for GaN epilayer grown on Si substrate by metal-organic chemical-vapor deposition
[作者:Lin, KL; Chang, EY; Hsiao, YL; Huang, WC; Luong, TT; Wong, YY; Li, TK; Tweet, D; Chiang, CH,期刊:Journal Of Vacuum Science & Technology B, 页码:473-477 , 文章类型: Article,,卷期:2010年28-3]
- GaN film grown on Si substrate using multilayer AlN/AlxGa1-xN buffer is studied by the low-pressure metal-organic chemical-vapor deposition method. The AlxGa1-xN films with Al composition varying from 1 to 0.66 were used...
- Mn-induced growth of InAs nanowires
[作者:Jabeen, F; Piccin, M; Felisari, L; Grillo, V; Bais, G; Rubini, S; Martelli, F; d'Acapito, F; Rovezzi, M; Boscherini, F,期刊:Journal Of Vacuum Science & Technology B, 页码:478-483 , 文章类型: Article,,卷期:2010年28-3]
- InAs nanowires have been grown by molecular beam epitaxy using Mn as growth catalyst. Nanowires (NWs) have been obtained on SiO2 and oxidized GaAs for growth temperatures in the range of 370-410 degrees C. The growth tem...
- Direct transfer of gold nanoislands from a MoS2 stamp to a Si-H surface
[作者:Deng, J; Troadec, C; Hui, HK; Joachim, C,期刊:Journal Of Vacuum Science & Technology B, 页码:484-489 , 文章类型: Article,,卷期:2010年28-3]
- A printing technique is proposed for the transfer of metallic nanoislands between two semiconductor surfaces in UHV. For the preparation of the stamp, a systematic study of the growth conditions of small, flat triangular...
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