- Analysis and metrology with a focused helium ion beam
[作者:Sijbrandij, S; Notte, J; Scipioni, L; Huynh, C; Sanford, C,期刊:Journal Of Vacuum Science & Technology B, 页码:73-77 , 文章类型: Proceedings Paper,,卷期:2010年28-1]
- The newly introduced ORION (TM) helium ion microscope has been used for high resolution imaging and nanofabrication. More recently, an energy sensitive detector has been developed that permits the measurement of the ener...
- Spin-coatable HfO2 resist for optical and electron beam lithographies
[作者:Saifullah, MSM; Khan, MZR; Hasko, DG; Leong, ESP; Neo, XL; Goh, ETL; Anderson, D; Jones, GAC; Welland, ME,期刊:Journal Of Vacuum Science & Technology B, 页码:90-95 , 文章类型: Article,,卷期:2010年28-1]
- Conventional patterning of HfO2 as a gate dielectric is a multistep complicated process that involves deposition of oxide, photolithography, and hard mask etching. In order to simplify the process of HfO2 patterning, the...
- Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate
[作者:Ye, XD; Ding, YC; Duan, YG; Liu, HZ; Shao, JY,期刊:Journal Of Vacuum Science & Technology B, 页码:86-89 , 文章类型: Article,,卷期:2010年28-1]
- A technique to fabricate an imprint template is proposed, based on a direct replication of the electronic-beam lithography resist patterns over a flexible conductive polymer substrate. This approach will simplify the tem...
|