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文章名     作者     期刊名     摘要     卷     期         如果没有找到您所需要的文献，请点击 ——此处申请     共180条记录   Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters [作者：Bronsgeest, MS; Barth, JE; Schwind, GA; Swanson, LW; Kruit, P,期刊：Journal Of Vacuum Science & Technology B, 页码：2049-2054 , 文章类型： Article，,卷期：2007年25-6] Energy spread is critical to the performance of probe forming systems working at high resolution. The energy spread in the probe is the convolution of the intrinsic spread upon emission and the broadening due to Coulomb ... High brightness 100-electron-beam source for high-resolution applications [作者：Zhang, Y; Kruit, P,期刊：Journal Of Vacuum Science & Technology B, 页码：2239-2244 , 文章类型： Article，,卷期：2007年25-6] The design of a 100-beam source for high-resolution applications is presented, comprising a Schottky emitter, an aperture lens array, an accelerator lens, and a conjugate blanker array. The beamlets emerge at 30 kV, comp... Cathode ray tube type electron gun as a source for multibeam electron lithography [作者：van den Brom, AJ; van Veen, AHV; Weeda, WM; Berglund, GZM; Wieland, M; Kruit, P,期刊：Journal Of Vacuum Science & Technology B, 页码：2245-2249 , 文章类型： Article，,卷期：2007年25-6] The authors have investigated the potential of using a dispenser cathode in space charge limited regime for employment in an electron beam lithography electron source. The space charge limitation guarantees stable and un... Annealing of electron beam induced deposits of platinum from Pt(PF3)(4) [作者：Ervin, MH; Chang, D; Nichols, B; Wickenden, A; Barry, J; Melngailis, J,期刊：Journal Of Vacuum Science & Technology B, 页码：2250-2254 , 文章类型： Article，,卷期：2007年25-6] Electron beam induced deposition (EBID) is of interest as a damage-free and resist-less means of incorporating nonconventional materials such as polymer fibers, nanowires, and carbon nanotubes into integrated circuits. A... Electrospun DNA nanofibers [作者：Bellan, LM; Strychalski, EA; Craighead, HG,期刊：Journal Of Vacuum Science & Technology B, 页码：2255-2257 , 文章类型： Article，,卷期：2007年25-6] The authors have electrospun fluorescently labeled DNA molecules into nanofibers with diameters of approximately 27 nm. They were able to image the nanofibers via fluorescence microscopy, scanning electron microscopy, an... Helium ion microscope invasiveness and imaging study for semiconductor applications [作者：Livengood, RH; Greenzweig, Y; Liang, T; Grumski, M,期刊：Journal Of Vacuum Science & Technology B, 页码：2547-2552 , 文章类型： Article，,卷期：2007年25-6] The helium ion gas field ion source is a novel charged particle source technology with potentially greater capabilities than electron beam based tools for imaging and nanomachining [Ward , J. Vac. Sci. Technol. B (to be ... Dry etch release processes for micromachining applications [作者：Zhu, T; Argyrakis, P; Mastropaolo, E; Lee, KK; Cheung, R,期刊：Journal Of Vacuum Science & Technology B, 页码：2553-2557 , 文章类型： Article，,卷期：2007年25-6] The authors report on the comparative study of two dry etch processes for polysilicon sacrificial layer release using vapor phase xenon difluoride (XeF2) continuous etching and inductively coupled plasma (ICP) etching wi... Study of fluorine bombardment on the electrical properties of AlGaN/GaN heterostructures [作者：Basu, A; Kumar, V; Adesida, I,期刊：Journal Of Vacuum Science & Technology B, 页码：2607-2610 , 文章类型： Article，,卷期：2007年25-6] The effects of fluorine ion bombardment on the channel transport properties of AlGaN/GaN heterostructures have been investigated. Ion bombardment of the heterostructure was carried out within a CF4 plasma in a reactive i... Yield improvement of 0.13 mu m Cu/low-k dual-damascene interconnection by organic cleaning process [作者：Kim, NH; Kim, SY; Lee, HK; Lee, KY; Kim, CI; Chang, EG,期刊：Journal Of Vacuum Science & Technology B, 页码：1819-1822 , 文章类型： Article，,卷期：2007年25-6] Cu/low-k dielectrics are required to reduce resistance-capacitance (RC) delay and parasitic capacitance at the back-end-of-line (BEOL) interconnection. Integration of Cu/low-k dielectrics (black diamond) for BEOL interco... Growth of ZnSe nanowires by pulsed-laser deposition [作者：Zhang, TW; Shen, YQ; Hu, W; Sun, J; Wu, J; Ying, ZF; Xu, N,期刊：Journal Of Vacuum Science & Technology B, 页码：1823-1826 , 文章类型： Article，,卷期：2007年25-6] Stoichiometric ZnSe nanowires have been grown by pulsed-laser deposition on GaAs (100) substrates coated with gold layers. The gold layer plays a key role as catalyst in the deposition of ZnSe nanowires. The thickness of... Fabrication of periodic microstructures on flexible polyimide membranes [作者：Shelton, DJ; Tharp, JS; Zummo, G; Folks, WR; Boreman, GD,期刊：Journal Of Vacuum Science & Technology B, 页码：1827-1831 , 文章类型： Article，,卷期：2007年25-6] Periodic metallic microstructures were fabricated on polyimide membranes. Techniques were developed to maintain flatness of the membrane during processing while still allowing for flexibility in the final structure. For ... Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics [作者：Salmassi, F; Gullikson, EM; Anderson, EH; Naulleau, PP,期刊：Journal Of Vacuum Science & Technology B, 页码：2055-2058 , 文章类型： Article，,卷期：2007年25-6] The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, ... Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman [作者：Laws, GM; Handugan, A; Eschrich, T; Boland, P; Sinclair, C; Myhajlenko, S; Poweleit, CD,期刊：Journal Of Vacuum Science & Technology B, 页码：2059-2063 , 文章类型： Article，,卷期：2007年25-6] The authors report on the top-down fabrication of silicon nanopillar arrays using electron beam lithography and enhanced plasma etch protocols for producing smoothed sidewalls. They have used cold development (2-4 degree... Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation [作者：Murali, R; Brown, D; Martin, KP; Meindl, JD,期刊：Journal Of Vacuum Science & Technology B, 页码：2064-2067 , 文章类型： Article，,卷期：2007年25-6] Electron beam lithography, when combined with optical lithography, is a promising approach to obtain good throughput. A bottleneck for this is resist sensitivity and the concomitant shot-noise limit for resolution. It is... Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography [作者：Tsai, HY; Smith, HI; Menon, R,期刊：Journal Of Vacuum Science & Technology B, 页码：2068-2071 , 文章类型： Article，,卷期：2007年25-6] The authors report on the fabrication of binary spiral zone plates and investigate an approach using gray scale scanning-electron-beam lithography to fabricate spiral-phase plates. The optical performance of the spiral z... Multiple beam sub-80-nm lithography with miniature electron beam column arrays [作者：Silver, CS; Spallas, JP; Muray, LP,期刊：Journal Of Vacuum Science & Technology B, 页码：2258-2265 , 文章类型： Article，,卷期：2007年25-6] Miniature electron beam columns have the potential for high resolution, high throughput maskless lithography applications because they can be scaled in number to form high density column arrays with low fabrication costs...