- Application of vector scanning in focused ion beam photomask repair system
[作者:Yasaka, A; Aramaki, F; Muramatsu, M; Kozakai, T; Matsuda, O; Sugiyama, Y; Doi, T; Takaoka, O; Hagiwara, R; Nakamae, K,期刊:Journal Of Vacuum Science & Technology B, 页码:2127-2130 , 文章类型: Article,,卷期:2008年26-6]
- With continuous reduction in linewidth of the VLSI devices, the pattern integrity of photomasks becomes considerably more important than ever. Consequently, requirement for the defect repair technology on photomasks is m...
- Scanning proximal probes for parallel imaging and lithography
[作者:Ivanova, K; Sarov, Y; Ivanov, T; Frank, A; Zollner, J; Bitterlich, C; Wenzel, U; Volland, BE; Klett, S; Rangelow, IW; Zawierucha, P; Zielony, M; Gotszalk, T; Dontzov, D; Schott, W; Nikolov, N; Zier, M; Schmidt, B; Engl, W; Sulzbach, T; Kostic, I,期刊:Journal Of Vacuum Science & Technology B, 页码:2367-2373 , 文章类型: Article,,卷期:2008年26-6]
- Scanning proximity probes are uniquely powerful tools for analysis, manipulation, and bottom-up synthesis. A massively parallel cantilever-probe platform is demonstrated. 128 self-sensing and self-actuated proximal probe...
- Quality assessment of antisticking layers for thermal nanoimprint
[作者:Scheer, HC; Hafner, W; Fidler, A; Mollenbeck, S; Bogdanski, N,期刊:Journal Of Vacuum Science & Technology B, 页码:2380-2384 , 文章类型: Article,,卷期:2008年26-6]
- Layers from fluorinated trichlorosilanes are in widespread use for the prevention of sticking in nanoimprint. It is generally assumed that these layers are monolayers, bonded to the substrate, and internally cross-linked...
- Toward 1 Tdot/in.(2) nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges
[作者:Yang, XM; Xu, Y; Seiler, C; Wan, L; Xiao, SG,期刊:Journal Of Vacuum Science & Technology B, 页码:2604-2610 , 文章类型: Article,,卷期:2008年26-6]
- Nanoimprint lithography presents unique opportunities for patterned media applications due to its advantages of sub-10 nm resolution capability, patterning of a whole disk in a single imprint step with reasonably high th...
- Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media
[作者:Miyazaki, T; Hayashi, K; Kobayashi, K; Kuba, Y; Ohyi, H; Obara, T; Mizuta, O; Murayama, N; Tanaka, N; Kawamura, Y; Uemoto, H,期刊:Journal Of Vacuum Science & Technology B, 页码:2611-2618 , 文章类型: Article,,卷期:2008年26-6]
- To fabricate master templates of high-density patterned magnetic media, the authors developed a high-resolution and high-throughput rotary stage electron beam mastering system. They accomplished the fabrication of discre...
- Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle
[作者:Kritsun, O; Lalovic, I; Rokitski, S; Partlo, B; La Fontaine, B; Farrar, N; Levinson, H,期刊:Journal Of Vacuum Science & Technology B, 页码:2145-2150 , 文章类型: Article,,卷期:2008年26-6]
- In this article the authors discuss the impact of coherence, or laser speckle, of current generation 193 nm argon fluoride (ArF) excimer sources on lithographic patterning. They report a new metrology capability to chara...
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