- Oxide nanotube analogues: CuO nanobarrels - art. no. 061806
[作者:Farrell, HH; Parra, RD,期刊:Journal Of Vacuum Science & Technology B, 页码:61806-61806 , 文章类型: Article,,卷期:2011年29-6]
- Recently, CuO "rings" on the order of 100 nm diameter have been observed experimentally by El-Azab and Liang [A. El-Azab and Y. Liang, Philos. Mag. 83, 3847 (2003)]. In a separate effort, we have used first principles de...
- MEMS process compatibility of multiwall carbon nanotubes - art. no. 06FE04
[作者:Cook, EH; Carter, DJD,期刊:Journal Of Vacuum Science & Technology B, 页码:FE604-FE604 , 文章类型: Article,,卷期:2011年29-6]
- While carbon nanotubes (CNT) have been proposed and used as structural elements (e. g., cantilevers, bearings, nanofluidic channels, etc.) in microsystems, knowledge of the compatibility of CNTs with a broad range of sta...
- Patterned atomic layer epitaxy of Si/Si(001):H - art. no. 06F201
[作者:Owen, JHG; Ballard, J; Randall, JN; Alexander, J; Von Ehr, JR,期刊:Journal Of Vacuum Science & Technology B, 页码:F6201-F6201 , 文章类型: Article,,卷期:2011年29-6]
- We aim to develop techniques for the building of atomically precise structures. On the H-terminated Si(001) surface, H atoms can be selectively removed using an STM tip with appropriate lithography conditions, creating a...
- Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabrication - art. no. 061604
[作者:Tjerkstra, RW; Woldering, LA; van den Broek, JM; Roozeboom, F; Setija, ID; Vos, WL,期刊:Journal Of Vacuum Science & Technology B, 页码:61604-61604 , 文章类型: Article,,卷期:2011年29-6]
- The authors present a method to pattern etch masks for arbitrary nano- and microstructures on different, inclined planes of a sample. Our method allows standard CMOS fabrication techniques to be used in different incline...
- Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification - art. no. 06F505
[作者:Lorusso, GF; Hendrickx, E; Davydova, N; Peng, Y; Eurlings, M; Feenstra, K; Jiang, J,期刊:Journal Of Vacuum Science & Technology B, 页码:F6505-F6505 , 文章类型: Article,,卷期:2011年29-6]
- Extreme ultraviolet lithography (EUVL) is the leading candidate for lithography beyond the 22 nm half-pitch device manufacturing node. These geometries impose tighter requirements for standard critical dimension metrolog...
- Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islands - art. no. 061805
[作者:Jungwirth, N; Dailey, E; Madras, P; Drucker, J,期刊:Journal Of Vacuum Science & Technology B, 页码:61805-61805 , 文章类型: Article,,卷期:2011年29-6]
- Au islands grown on Si(111) substrates at substrate temperatures of 500 and 600 degrees C, both of which are greater than the bulk Au-Si eutectic temperature of 363 degrees C, are characterized using atomic force (AFM) a...
- PEN/Si3N4 bilayer film for dc bus capacitors in power converters in hybrid electric vehicles - art. no. 061401
[作者:Zou, C; Zhang, QM; Zhang, SH; Kushner, D; Zhou, X; Bernard, R; Orchard, RJ,期刊:Journal Of Vacuum Science & Technology B, 页码:61401-61401 , 文章类型: Article,,卷期:2011年29-6]
- High performance hybrid bilayer capacitor film has been developed by controlled deposition of silicon nitride (Si3N4) on polyethylene naphthalate (PEN). It was found that silicon nitride prepared with plasma-enhanced che...
- Multilayer infrared metamaterial fabrication using membrane projection lithography - art. no. 06FF04
[作者:Burckel, DB; Wendt, JR; Samora, S; Sinclair, MB; Brener, I; Ginn, JC,期刊:Journal Of Vacuum Science & Technology B, 页码:FF604-FF604 , 文章类型: Article,,卷期:2011年29-6]
- Membrane projection lithography is extended from a single layer fabrication technique to a multilayer process, adding polymeric backfill and planarization after each layer is completed. Unaligned contact lithography is u...
- Multitip atomic force microscope lithography system for high throughput nanopatterning - art. no. 06FD03
[作者:Oh, Y; Choi, CM; Noh, K; Villwock, D; Jin, SH; Kwon, G; Lee, H,期刊:Journal Of Vacuum Science & Technology B, 页码:FD603-FD603 , 文章类型: Article,,卷期:2011年29-6]
- An atomic force microscope (AFM) system with multiple parallel lithography probes of equal heights on a single cantilever was created in order to improve the throughput of AFM lithography. The multitip probe was fabricat...
- Nanofabrication down to 10 nm on a plastic substrate - art. no. 06FG07
[作者:Tao, L; Lee, J; Akinwande, D,期刊:Journal Of Vacuum Science & Technology B, 页码:FG607-FG607 , 文章类型: Article,,卷期:2011年29-6]
- In this work, we proved the feasibility of nanofabrication down to 10 nm on a plastic substrate with varied fabrication techniques. Durable polyimide sheets (25-200 mu m thick), commercially available as Kapton (R) film,...
- Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis - art. no. 06F604
[作者:Tan, SD; Livengood, R; Hack, P; Hallstein, R; Shima, D; Notte, J; McVey, S,期刊:Journal Of Vacuum Science & Technology B, 页码:F6604-F6604 , 文章类型: Article,,卷期:2011年29-6]
- As the semiconductor device scaling trend continues, advancement in both focused ion beam source development and application innovations are needed to retain failure analysis and nanomachining application capabilities. I...
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