- Improvement of scanning probe microscopy local oxidation nanolithography
[作者:Nishimura, S; Toyofuku, T; Miyashita, K; Takemura, Y; Shirakashi, J,期刊:Journal Of Vacuum Science & Technology B, 页码:948-952 , 文章类型: Article,,卷期:2009年27-2]
- In order to investigate the factors that control the growth of Si local oxide, the authors have a comparative study between tapping and contact mode scanning probe microscopy (SPM) local oxidation experiments using the s...
- Reduction effect of line edge roughness on time-dependent dielectric breakdown lifetime of Cu/low-k interconnects by using CF3I etching
[作者:Soda, E; Oda, N; Ito, S; Kondo, S; Saito, S; Samukawa, S,期刊:Journal Of Vacuum Science & Technology B, 页码:649-653 , 文章类型: Article,,卷期:2009年27-2]
- The authors investigated the etching of grooves in low-k in Cu technology. Correlation between the line edge roughness (LER) and the time-dependent dielectric breakdown (TDDB) reliability for 100 run pitch Cu interconnec...
- Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
[作者:Houle, FA; Maxim, N; Huijbregtse, J; Deline, VR; Truong, H; van Schaik, W,期刊:Journal Of Vacuum Science & Technology B, 页码:654-664 , 文章类型: Article,,卷期:2009年27-2]
- Because volatile species containing Si and S desorbed from photoresists during exposure to light can irreversibly damage optical elements inside a photolithography tool, accurate quantification of vapor fluxes is essenti...
- Nanoscale patterning of NiFe surface by scanning probe microscopy scratch nanolithography
[作者:Miyashita, K; Nishimura, S; Toyofuku, T; Shirakashi, JI,期刊:Journal Of Vacuum Science & Technology B, 页码:953-957 , 文章类型: Article,,卷期:2009年27-2]
- Scratch nanolithography by scanning probe microscopy (SPM), which enables us to fabricate nanoscale grooves on the surfaces, was performed for ferromagnetic metals from the point of view of fabrication technologies of pl...
- Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists
[作者:Anderson, CN; Naulleau, PP,期刊:Journal Of Vacuum Science & Technology B, 页码:665-670 , 文章类型: Article,,卷期:2009年27-2]
- A corner rounding metric has been used to determine the deprotection blur of Rohm and Haas XP 5435, XP 5271, and XP 5496 extreme ultraviolet (EUV) photoresists as base wt % is varied, an experimental open platform photor...
- Mesa sample preparation for secondary ion mass spectrometry depth profiling using an automated dicing saw
[作者:Guenther, T; Jiang, ZX; Kim, K; Sieloff, DD,期刊:Journal Of Vacuum Science & Technology B, 页码:677-680 , 文章类型: Article,,卷期:2009年27-2]
- The use of secondary ion mass spectrometry to verify dopant profiles, either for process control or for simulation modeling, is an established practice in semiconductor fabrication, where precise dopant concentrations ar...
- Dry etching of GaAs in high pressure, capacitively coupled BCl3/N-2 plasmas
[作者:Lee, JW; Kim, JK; Lee, JH; Joo, YW; Park, YH; Noh, HS; Pearton, SJ,期刊:Journal Of Vacuum Science & Technology B, 页码:681-683 , 文章类型: Article,,卷期:2009年27-2]
- The authors found high etch rates (similar to 0.4 mu m min(-1)) for GaAs in a capacitively coupled plasma (CCP) system using BCl3/N-2 discharges even at an operating pressure of 150 mTorr, which allows the use of simple ...
- Wafer-scale production of carbon nanofiber probes
[作者:Kitazawa, M; Ohta, R; Sugita, Y; Inaba, K; Tanemura, M,期刊:Journal Of Vacuum Science & Technology B, 页码:975-979 , 文章类型: Article,,卷期:2009年27-2]
- The 4 in. wafer-scale production of probes tipped with single carbon nanofibers (CNF probes) for scanning probe microscope was achieved by an Ar+-ion-irradiation method. For the wafer-scale production, an arrangement of ...
- Application of ion-induced carbon nanocomposite fibers to magnetic force microscope probes
[作者:Sugita, Y; Kitazawa, M; Yusop, MZM; Tanemura, M; Hayashi, Y; Ohta, R,期刊:Journal Of Vacuum Science & Technology B, 页码:980-983 , 文章类型: Article,,卷期:2009年27-2]
- Small-scale batch fabrication of Co-included carbon nanofibers (Co-CNFs) onto commercially available Si cantilevers for scanning probe microscope by an Ar+-ion-irradiation method with a simultaneous Co supply was demonst...
- Theoretical analysis of the energy exchange and cooling in field emission from the conduction band of the n-type semiconductor
[作者:Chung, MS; Jang, YJ; Mayer, A; Weiss, BL; Miskovsky, NM; Cutler, PH,期刊:Journal Of Vacuum Science & Technology B, 页码:692-697 , 文章类型: Article,,卷期:2009年27-2]
- Field emission has been theoretically found to contribute to the cooling only for the semiconductor cathodes. Using the formal theory developed recently by authors, the authors have calculated the energy exchange As as a...
- Studies of W(100) modified by praseodymium oxide by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and photoelectron emission microscopy
[作者:Kawakubo, T; Nakano, Y; Nakane, H,期刊:Journal Of Vacuum Science & Technology B, 页码:698-700 , 文章类型: Article,,卷期:2009年27-2]
- The tungsten (100) surface modified by praseodymium oxide is observed by x-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED). Pr metal is deposited on single-crystalline W(100). Then, when t...
- Emission and focusing characteristics of volcano-structured double-gated field emitter arrays
[作者:Neo, Y; Takeda, M; Soda, T; Nagao, M; Yoshida, T; Kanemaru, S; Sakai, T; Hagiwara, K; Saito, N; Aoki, T; Mimura, H,期刊:Journal Of Vacuum Science & Technology B, 页码:701-704 , 文章类型: Article,,卷期:2009年27-2]
- Volcano-structured double-gated field emitter arrays (VDG-FEAs) with different focusing electrode height have been fabricated and the focusing characteristics for each VDG-FEAs were evaluated in detail. The authors exper...
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