- Novel magnetic microstigmator for electron beam astigmatism correction in the electron beam microcolumn system
[作者:Rong, R; Kim, HS; Park, SS; Hwang, NW; Park, KW; Jin, SW; Ahn, CH,期刊:Journal Of Vacuum Science & Technology B, 页码:2020-2024 , 文章类型: Article,,卷期:2007年25-6]
- A novel magnetic microstigmator was developed for the astigmatism correction in the electron beam microcolumn system. The magnetic microstigmator consists of eight magnetic poles coupled with micromachined solenoid-type ...
- Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors
[作者:Pauliac-Vaujour, S; Brianceau, P; Landis, S; Chiaroni, J; Faynot, O,期刊:Journal Of Vacuum Science & Technology B, 页码:2030-2033 , 文章类型: Article,,卷期:2007年25-6]
- Fully depleted silicon on insulator (FDSOI) devices with high-k dielectrics and metal gate are promising candidates for sub-45-nm complementary metal oxide semiconductor technologies. At present, the gate length reductio...
- Enhanced stitching for the fabrication of photonic structures by electron beam lithography
[作者:Gnan, M; Macintyre, DS; Sorel, M; De la Rue, RM; Thoms, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2034-2037 , 文章类型: Article,,卷期:2007年25-6]
- Large-area electron beam lithography tools pattern substrates as a series of writing fields that are stitched together. Pattern defects, termed stitching errors, can arise at field boundaries and these can have detriment...
- Focused electron beam induced deposition of nickel
[作者:Perentes, A; Sinicco, G; Boero, G; Dwir, B; Hoffmann, P,期刊:Journal Of Vacuum Science & Technology B, 页码:2228-2232 , 文章类型: Article,,卷期:2007年25-6]
- Focused electron beam induced depositions of nickel-containing materials obtained by using bis(methylcyclopentadienyl)nickel(II) Ni(C5H4CH3)(2) and tetrakis(trifluorophosphine)nickel(0) Ni(PF3)(4) as precursors, were com...
- Lithography, plasmonics, and subwavelength aperture exposure technology
[作者:Ngu, Y; Peckerar, M; Dagenais, M; Barry, J; Dutt, BR,期刊:Journal Of Vacuum Science & Technology B, 页码:2471-2475 , 文章类型: Article,,卷期:2007年25-6]
- This article presents the first experimental evidence that plasmonic excitation in metal films perforated with regular arrays of subwavelength apertures can produce high resolution far-field radiation patterns of suffici...
- Critical parameter determination of sonic flow controller diamond microtubes and micronozzles
[作者:Mammana, SS; Degasperia, FT; Salvadori, MC; Sparapani, DC; Laino, MF; Rangel, RC; Teixeira, FS; Cattani, M,期刊:Journal Of Vacuum Science & Technology B, 页码:1804-1807 , 文章类型: Article,,卷期:2007年25-6]
- In this article, the authors measure throughput of sonic diamond microtubes and micronozzles that can work as passive gas flow controllers and flow meters under choking conditions. The behavior of the outlet pressure thr...
- On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process
[作者:Jinnai, B; Orita, T; Konishi, M; Hashimoto, J; Ichihashi, Y; Nishitani, A; Kadomura, S; Ohtake, H; Samukawa, S,期刊:Journal Of Vacuum Science & Technology B, 页码:1808-1813 , 文章类型: Article,,卷期:2007年25-6]
- The authors investigated charge accumulation in high-aspect-ratio contact-hole structures by using the new on-wafer monitoring device they fabricated on a Si substrate of 8 in. in diameter by using a conventional product...
- Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications
[作者:Hohle, C; Arndt, C; Choi, KH; Kretz, J; Lutz, T; Thrum, F; Keil, K,期刊:Journal Of Vacuum Science & Technology B, 页码:2038-2040 , 文章类型: Article,,卷期:2007年25-6]
- An overview about process window evaluation and characteristic features of photoresists for e-beam/optical hybrid lithography as well as mix and match applications and implementation into new integration concepts is give...
- Influence of temperature on HSQ electron-beam lithography
[作者:Haffner, M; Haug, A; Heeren, A; Fleischer, M; Peisert, H; Chasse, T; Kern, DP,期刊:Journal Of Vacuum Science & Technology B, 页码:2045-2048 , 文章类型: Article,,卷期:2007年25-6]
- The authors present a study of the influence of temperature on hydrogen silsesquioxane (HSQ) e-beam lithography during drying, developing, and postdevelopment baking. In accordance with the observation that tempering at ...
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