- Thermionic electron emission from chemical vapor deposition diamond by nanosecond laser heating
[作者:Choi, BK; Kang, WP; Davis, IL; Davidson, JL; Hu, ST; Pitz, RW,期刊:Journal Of Vacuum Science & Technology B, 页码:557-561 , 文章类型: Article,,卷期:2009年27-2]
- Vacuum thermionic emission behaviors from bare silicon and chemical vapor deposition diamond coated silicon using laser pulse heating are reported. Under vacuum and subjected to a moderate biasing voltage, the bare silic...
- Electron emission from ultralarge area metal-oxide-semiconductor electron emitters
[作者:Thomsen, LB; Nielsen, G; Vendelbo, SB; Johansson, M; Hansen, O; Chorkendorff, I,期刊:Journal Of Vacuum Science & Technology B, 页码:562-567 , 文章类型: Article,,卷期:2009年27-2]
- Ultralarge metal-oxide-semiconductor (MOS) devices with an active oxide area of 1 cm(2) have been fabricated for use as electron emitters. The MOS structures consist of a Si substrate, a SiO2 tunnel barrier (similar to 5...
- Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching
[作者:Feng, JB; Chen, Y; Blair, J; Kurt, H; Hao, R; Citrin, DS; Summers, CJ; Zhou, ZP,期刊:Journal Of Vacuum Science & Technology B, 页码:568-572 , 文章类型: Article,,卷期:2009年27-2]
- In this article, the fabrication process of annular photonic crystals on silicon-on-insulator wafers was addressed for the first time. A self-alignment procedure for nanofabrication using atomic layer deposition and sacr...
- Direct-to-indirect transition observed in quantum dot photoluminescence with nanoprobe indentation
[作者:Ozasa, K; Maeda, M; Hara, M; Kakoi, H; Xu, LX; Liang, YH; Arai, Y,期刊:Journal Of Vacuum Science & Technology B, 页码:934-938 , 文章类型: Article,,卷期:2009年27-2]
- Photoluminescence (PL) of InGaAs/GaAs quantum dots (QDs) is found to be enhanced and then quenched by localized-strain effects induced by the indentation of a nanoprobe. By using a nanoprobe with a flat cylindrical apex ...
- Scanning probe anodization patterning of Si substrates covered with a self-assembled monolayer dependent on surface hydrophilicity
[作者:Han, J; Kasahara, D; Ichii, T; Murase, K; Sugimura, H,期刊:Journal Of Vacuum Science & Technology B, 页码:928-933 , 文章类型: Article,,卷期:2009年27-2]
- Contact-mode atomic force microscopy (AFM)-based anodization patterning was performed on silicon (Si) substrates covered with a self-assembled monolayer (SAM) in order to investigate effects of relative humidity (RH), su...
- Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment
[作者:Czaplewski, DA; Tallant, DR; Patrizi, GA; Wendt, JR; Montoya, B,期刊:Journal Of Vacuum Science & Technology B, 页码:581-584 , 文章类型: Article,,卷期:2009年27-2]
- The authors have developed a treatment process to improve the etch resistance of,in electron beam lithography resist (ZEP 520A) to allow direct pattern transfer from the resist into a hard mask using plasma etching witho...
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