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文章名     作者     期刊名     摘要     卷     期         如果没有找到您所需要的文献，请点击 ——此处申请     共171条记录   Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate [作者：Taniguchi, J; Tsuji, S; Aratani, M,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M45-C6M49 , 文章类型： Article，,卷期：2010年28-6] A three-dimensional (3D) seamless roll mold is difficult to fabricate because of its cylindrical shape. However, seamless 3D nanoscale patterns are in great demand for optical film applications and printed electronics. T... Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy [作者：Kobayashi, K; Kubo, S; Matsui, S; Nakagawa, M,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M50-C6M56 , 文章类型： Article，,卷期：2010年28-6] The occurrence of resist pattern defects in UV nanoimprinting with a spincoated resin thin film on a silicon wafer was studied by fluorescent microscopy using a fluorescent UV-curable liquid resin causing radical photopo... High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application [作者：Kreindl, G; Glinsner, T; Miller, R; Treiblmayr, D; Fodisch, R,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M57-C6M62 , 文章类型： Article，,卷期：2010年28-6] Herein, the authors demonstrate the use of step-and-repeat nanoimprint lithography for the fabrication of wafer level lens master. Thereby, the authors will focus on so far unmet needs in regard to lateral lens to lens p... Field emission stability and properties of simultaneously grown microcrystalline diamond and carbon nanostructure films [作者：Uppireddi, K; Weiner, BR; Morell, G,期刊：Journal Of Vacuum Science & Technology B, 页码：1202-1205 , 文章类型： Article，,卷期：2010年28-6] The temporal stability and electron field emission characteristics of simultaneously grown microcrystalline diamond and carbon nanostructures were investigated. The films were prepared by hot filament chemical vapor depo... Electron beam induced etching of silicon with SF6 [作者：Vanhove, N; Lievens, P; Vandervorst, W,期刊：Journal Of Vacuum Science & Technology B, 页码：1206-1209 , 文章类型： Article，,卷期：2010年28-6] Electron beam induced etching (EBIE) with SF6 precursor molecules has been demonstrated as an approach to induce localized etching of Si with an etch yield of approximately 0.003 atoms/incoming electron. Further understa... Simultaneous observation of surface topography and elasticity at atomic scale by multifrequency frequency modulation atomic force microscopy [作者：Naitoh, Y; Ma, ZM; Li, YJ; Kageshima, M; Sugawara, Y,期刊：Journal Of Vacuum Science & Technology B, 页码：1210-1214 , 文章类型： Article，,卷期：2010年28-6] The authors integrated the frequency modulation (FM) technique into multifrequency atomic force microscopy (AFM). Based on theoretical considerations, simultaneous excitation of the cantilever oscillation at the first an... Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronics [作者：Zhou, M; Aryal, M; Mielczarek, K; Zakhidov, A; Hu, W,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M63-C6M67 , 文章类型： Article，,卷期：2010年28-6] The authors report that the poly(3-hexylthiophene-2,5-diyl) (P3HT) nanogratings shaped by nanoimprint lithography show enhanced hole mobility and strong anisotropy of conductance due to nanoimprint-induced three-dimensio... Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study [作者：Taga, A; Yasuda, M; Kawata, H; Hirai, Y,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M68-C6M71 , 文章类型： Article，,卷期：2010年28-6] The molecular size effects on resist filling process in nanoimprint lithography are studied by molecular dynamics simulation. Poly(methyl methacrylate) is selected as a resist model. The press force required to fill the ... Defect analysis for patterned media [作者：Ye, ZM; Fretwell, J; Luo, K; Ha, S; Schmid, G; LaBrake, D; Resnick, DJ; Sreenivasan, SV,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M7-C6M11 , 文章类型： Article，,卷期：2010年28-6] Imprint lithography has been shown to be an effective technique for the replication of nanoscale features. Acceptance of imprint lithography for manufacturing will require a demonstration of defect levels commensurate wi... Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography [作者：Francone, A; Iojoiu, C; Poulain, C; Lombard, C; Pepin-Donat, B; Boussey, J; Zelsmann, M,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M72-C6M76 , 文章类型： Article，,卷期：2010年28-6] In this work, the authors evaluate the impact of chemical and mechanical properties of UV nanoimprint lithography resists on the durability of antisticking treatments applied on the quartz mold surface. To do this, three... Impact of substrate deformation on demolding force for thermal imprint process [作者：Kawata, H; Watanabe, Y; Fujikawa, N; Yasuda, M; Hirai, Y,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M77-C6M82 , 文章类型： Article，,卷期：2010年28-6] The impact of deformation on the demolding force is investigated both experimentally and by simulation for the thermal imprint process. The effects of substrate thickness are the focus of this article. In experiments, on... Imprinted quarter wave plate at terahertz frequency [作者：Saha, SC; Ma, Y; Grant, JP; Khalid, A; Cumming, DRS,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M83-C6M87 , 文章类型： Article，,卷期：2010年28-6] The authors have imprinted high aspect ratio artificial dielectric quarter wave plates (QWPs) on polymers for use at 2.6, 3.2, and 3.8 THz. The QWPs are imprinted on high density polyethylene using silicon masters. The g... Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineering [作者：Noh, K; Choi, C; Kim, JY; Oh, Y; Brammer, KS; Loya, MC; Jin, SH,期刊：Journal Of Vacuum Science & Technology B, 页码：C6M88-C6M92 , 文章类型： Article，,卷期：2010年28-6] The authors present successful fabrications of hexagonally ordered and vertically aligned anodic aluminum oxide (AAO) nanotube array patterns over a large area (at least similar to 6 x 6 mm(2)) by utilizing nanoimprint-g... Nonlinearities in depth profiling nanometer layers [作者：Seah, MP; Mulcahy, CPA; Biswas, S,期刊：Journal Of Vacuum Science & Technology B, 页码：1215-1221 , 文章类型： Article，,卷期：2010年28-6] An analysis is made of the sputter depth profiling of ultrathin silicon dioxide layers on silicon to evaluate the variation in the sputtering rate in the first few nanometers. Such changes in sputtering rate are importan... Challenges in the fabrication of an optical frequency ground plane cloak consisting of silicon nanorod arrays [作者：Blair, J; Brown, D; Tamma, VA; Park, W; Summers, C,期刊：Journal Of Vacuum Science & Technology B, 页码：1222-1230 , 文章类型： Article，,卷期：2010年28-6] The application of transformation optical techniques to photonic crystal-like dielectric structures has facilitated the creation of invisibility cloaks that operate at optical wavelengths. In this article, the authors pr... Ni full-filling into Al2O3/Al film with etched tunnels using a polyethylene glycol solution bath in electroless-plating [作者：Jang, JH; Lee, CH; Choi, WS; Kim, NJ; Kim, TY; Kim, TY; Kim, JH; Park, C; Suh, SJ,期刊：Journal Of Vacuum Science & Technology B, 页码：1231-1234 , 文章类型： Article，,卷期：2010年28-6] Ni/Al2O3/Al film was fabricated for a high performance capacitor using electrochemical etching, anodizing, and electroless-plating. The focus of this study was to form seamless and void-free Ni electrodes on Al2O3/Al wit...