- Sub-15 nm nanoimprint molds and pattern transfer
[作者:Morecroft, D; Yang, JKW; Schuster, S; Berggren, KK; Xia, QF; Wu, W; Williams, RS,期刊:Journal Of Vacuum Science & Technology B, 页码:2837-2840 , 文章类型: Article,,卷期:2009年27-6]
- This work addresses the challenges in fabricating sub-10 nm sized features, dense (sub-15 nm half-pitch) arbitrary-pattern nanoimprint molds, as well as pattern transfer of the molds using nanoimprint. The molds were fab...
- Formation of TiO2 nanopattern using reverse imprinting and sol-gel method
[作者:Yoon, KM; Yang, KY; Lee, H; Kim, HS,期刊:Journal Of Vacuum Science & Technology B, 页码:2810-2813 , 文章类型: Article,,卷期:2009年27-6]
- TiO2 and its nanopattern fabrication have been studied intensively because of its wide band gap and photocatalystic nature. TiO2 nanopatterns can be made by conventional patterning techniques, consisting of deposition, p...
- UV irradiation effect on sol-gel indium tin oxide nanopatterns replicated by room-temperature nanoimprint
[作者:Kang, Y; Okada, M; Nakamatsu, KI; Kanda, K; Haruyama, Y; Matsui, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2805-2809 , 文章类型: Article,,卷期:2009年27-6]
- The authors report the first room-temperature nanoimprint lithography (RT-NIL) process using sol-gel indium tin oxide (ITO) as a replicated material. The spin-coated ITO film has to be annealed over 600 degrees C to obta...
- Fabrication of poly(3-hexylthiophene) self-switching diodes using thermal nanoimprint lithography and argon milling
[作者:Kettle, J; Whitelegg, S; Song, AM; Madec, MB; Yeates, S; Turner, ML; Kotacka, L; Kolarik, V,期刊:Journal Of Vacuum Science & Technology B, 页码:2801-2804 , 文章类型: Article,,卷期:2009年27-6]
- In this article, the fabrication of poly(3-hexylthiophene) self-switching diodes (SSDs) is described. The unique design of the SSD enables it to be fabricated from a single layer of semiconductor material with a single l...
- Fully self-aligned process for fabricating 100 nm gate length enhancement mode GaAs metal-oxide-semiconductor field-effect transistors
[作者:Li, X; Hill, RJW; Longo, P; Holland, MC; Zhou, HP; Thoms, S; Macintyre, DS; Thayne, IG,期刊:Journal Of Vacuum Science & Technology B, 页码:3153-3157 , 文章类型: Article,,卷期:2009年27-6]
- This article describes a process flow that has enabled the first demonstration of functional, fully self-aligned 100 nm enhancement mode GaAs metal-oxide-semiconductor field-effect transistors (MOSFETs) with GaxGdyOz as ...
- Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
[作者:Jung, HY; Park, YR; Lee, HJ; Lee, NE; Jeong, CY; Ahn, J,期刊:Journal Of Vacuum Science & Technology B, 页码:2361-2365 , 文章类型: Article,,卷期:2009年27-6]
- Among the core extreme ultraviolet lithography (EUVL) technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration from that of conventi...
- SU-8-based immunoisolative microcontainer with nanoslots defined by nanoimprint lithography
[作者:Kwon, J; Trivedi, K; Krishnamurthy, NV; Hu, W; Lee, JB; Gimi, B,期刊:Journal Of Vacuum Science & Technology B, 页码:2795-2800 , 文章类型: Article,,卷期:2009年27-6]
- Cells can secrete biotherapeutic molecules that can replace or restore host function. The transplantation of such cells is a promising therapeutic modality for the treatment of several diseases including type 1 diabetes ...
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