- Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media
[作者:Sbiaa, R; Tan, EL; Seoh, RM; Aung, KO; Wong, SK; Piramanayagam, SN,期刊:Journal Of Vacuum Science & Technology B, 页码:1666-1669 , 文章类型: Article,,卷期:2008年26-5]
- Using electron beam lithography and ZEP 520 resist, molds with a track pitch of 50 nm were fabricated on thermal silicon oxide for discrete track recording applications. In this article, the detailed process for patterni...
- Oxidation behavior of In95Sn5 solid solution
[作者:Ramasamy, S; Sabarinathan, V; Agarwal, N; Smith, DJ,期刊:Journal Of Vacuum Science & Technology B, 页码:1670-1674 , 文章类型: Article,,卷期:2008年26-5]
- Nanocrystalline indium-tin alloy particles, having the composition of In95Sn5, were prepared by the inert-gas condensation technique and then examined for the possible formation of a core-shell structure after oxidation ...
- Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
[作者:Carlstrom, CF; van der Heijden, R; Andriesse, MSP; Karouta, F; van der Heijden, RW; van der Drift, E; Salemink, HWM,期刊:Journal Of Vacuum Science & Technology B, 页码:1675-1683 , 文章类型: Article,,卷期:2008年26-5]
- An extensive investigation has been performed on inductively coupled plasma etching of InP. An important motivation for this work is the fabrication of high-aspect-ratio holes for photonic crystals. The essential chemist...
- Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography
[作者:Ting, YH; Park, SM; Liu, CC; Liu, XS; Himpsel, FJ; Nealey, PF; Wendt, AE,期刊:Journal Of Vacuum Science & Technology B, 页码:1684-1689 , 文章类型: Article,,卷期:2008年26-5]
- Polystyrene-block-poly(methyl methacrylate), (PS-b-PMMA) diblock copolymer is a promising lithography alternative for nanometer scale features. The two components segregate into nanoscale domains when the polymer solutio...
- Field-emission fluorescent lamp using carbon nanotubes on a wire-type cold cathode and a reflecting anode
[作者:Huang, JX; Chen, J; Deng, SZ; She, JC; Xu, NS,期刊:Journal Of Vacuum Science & Technology B, 页码:1700-1704 , 文章类型: Article,,卷期:2008年26-5]
- Wire-type cold cathode was prepared by direct growth of carbon nanotube (CNT) on stainless-steel wire using thermal chemical vapor deposition. By varying the growth temperature, gas flow direction, and reactant gas mixtu...
- Programmable proximity aperture lithography with MeV ion beams
[作者:Puttaraksa, N; Gorelick, S; Sajavaara, T; Laitinen, M; Singkarat, S; Whitlow, HJ,期刊:Journal Of Vacuum Science & Technology B, 页码:1732-1739 , 文章类型: Article,,卷期:2008年26-5]
- A novel MeV ion beam programmable proximity aperture lithography system has been constructed at the Accelerator Laboratory of the University of Jyvaskyla, Finland. This facility can be used to fabricate three dimensional...
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