- Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models
[作者:Hsu, CC; Hoang, J; Le, V; Chang, JP,期刊:Journal Of Vacuum Science & Technology B, 页码:1919-1925 , 文章类型: Article,,卷期:2008年26-6]
- A two-dimensional numerical fluid model was developed to investigate the effects of reactor design on the radial profiles of plasma species, namely, etch products and positive ions, during shallow trench isolation etchin...
- Projection maskless patterning for nanotechnology applications
[作者:Platzgummer, E; Loeschner, H; Gross, G,期刊:Journal Of Vacuum Science & Technology B, 页码:2059-2063 , 文章类型: Article,,卷期:2008年26-6]
- Projection maskless patterning (PMLP) is based on a programmable aperture plate system and on charged particle projection optics with 200x reduction, providing thousands of electron or ion (H+, He+, Ar+, Xe+, C-60-) beam...
- Optical characterization of a hydrogen silsesquioxane lithography process
[作者:Samarelli, A; Macintyre, DS; Strain, MJ; De La Rue, RM; Sorel, M; Thoms, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2290-2294 , 文章类型: Article,,卷期:2008年26-6]
- In this article the authors report on a new optical linewidth metrology method which uses measured changes in the resonant wavelength of fabricated ring resonator structures to establish the linewidth of waveguides. The ...
- Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise
[作者:Anderson, CN; Naulleau, PP; Niakoula, D; Hassanein, E; Brainard, R; Gallatin, G; Dean, K,期刊:Journal Of Vacuum Science & Technology B, 页码:2295-2299 , 文章类型: Article,,卷期:2008年26-6]
- A contact-hole deprotection blur metric has been used to monitor the deprotection blur of an experimental open platform resist (EH27) as the wt % of base and photoacid generator (PAG) were varied. A six times increase in...
- Dynamic stencil lithography on full wafer scale
[作者:Savu, V; van den Boogaart, MAF; Brugger, J; Arcamone, J; Sansa, M; Perez-Murano, F,期刊:Journal Of Vacuum Science & Technology B, 页码:2054-2058 , 文章类型: Article,,卷期:2008年26-6]
- In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on ...
|