- Progress in extreme ultraviolet interferometric and holographic lithography
[作者:Isoyan, A; Cheng, YC; Jiang, F; Wallace, J; Cerrinab, F; Bollepalli, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2145-2150 , 文章类型: Article,,卷期:2007年25-6]
- The Center for Nanotechnology has developed an advanced beamline dedicated to nanopatterning using the radiation from a new undulator on the Aladdin storage ring at the Synchrotron Radiation Center of the University of W...
- Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool
[作者:Anderson, CN; Naulleau, PP; Denham, P; Kemp, D; Rekawa, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2151-2154 , 文章类型: Article,,卷期:2007年25-6]
- Illumination uniformity and reproducibility in extreme ultraviolet (EUV) microfield exposure tools are critical to many aspects of the EUV lithography development task. Here, the authors present a scanning-field-averagin...
- Fabrication of 3D-photonic crystals via UV-nanoimprint lithography
[作者:Glinsner, T; Lindner, P; Muhlberger, M; Bergmair, I; Schoftner, R; Hingerl, K; Schmid, H; Kley, EB,期刊:Journal Of Vacuum Science & Technology B, 页码:2337-2340 , 文章类型: Article,,卷期:2007年25-6]
- Optical lithography will reach its limits due to the diffraction effects encountered and the necessity for using complex resolution enhancement techniques like optical proximity correction, phase shift masks, and off-axi...
- Time dependent analysis of the resist deformation in thermal nanoimprint
[作者:Hirai, Y; Onishi, Y; Tanabe, T; Nishihata, M; Iwasaki, T; Kawata, H; Iriye, Y,期刊:Journal Of Vacuum Science & Technology B, 页码:2341-2345 , 文章类型: Article,,卷期:2007年25-6]
- Time evolution of the resist deformation process in the thermal nanoimprint lithography (NIL) has been investigated by both experiment and simulation study. For the numerical simulation, the authors newly developed a sim...
- Nanoimprint lithography processes on 200 mm Si wafer for optical application: Residual thickness etching anisotropy
[作者:Chaix, N; Gourgon, C; Perret, C; Landis, S; Leveder, T,期刊:Journal Of Vacuum Science & Technology B, 页码:2346-2351 , 文章类型: Article,,卷期:2007年25-6]
- It is well known that one limitation of thermal nanoimprint lithography is the difficulty to imprint simultaneously nano- and microstructures because of the resulting different residual layer thicknesses, which induce a ...
- Hybrid carbon nanotube-silicon complementary metal oxide semiconductor circuits
[作者:Meric, I; Caruso, V; Caldwell, R; Hone, J; Shepard, KL; Wind, SJ,期刊:Journal Of Vacuum Science & Technology B, 页码:2577-2580 , 文章类型: Article,,卷期:2007年25-6]
- A hybrid technology is presented that combines carbon nanotube field-effect transistors (CNFET) with conventional, silicon-based complementary metal oxide semiconductor (CMOS) technology. The fabrication involves the che...
- Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
[作者:Kim, S; Woo, S; Kim, H; Jeong, W; Park, T; Kim, H; Kim, SB; Jeon, H,期刊:Journal Of Vacuum Science & Technology B, 页码:1922-1927 , 文章类型: Article,,卷期:2007年25-6]
- HfSixOyNz layers were grown on Si substrates prior to HfO2 growth in order to investigate the growth of an interfacial layer between HfO2 and Si substrate and the chemical composition changes at the interfacial region. T...
- Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography
[作者:Sogard, MR; Mikkelson, AR; Nataraju, M; Turner, KT; Engelstad, RL,期刊:Journal Of Vacuum Science & Technology B, 页码:2155-2161 , 文章类型: Article,,卷期:2007年25-6]
- The successful implementation of extreme ultraviolet lithography (EUVL) requires the use of an electrostatic chuck to both support and flatten the mask during scanning exposure. The EUVL Mask and Chucking Standards, SEMI...
- Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap
[作者:Ullmann, F; Grossmann, F; Ovsyannikov, VP; Gierak, J; Bourhis, E; Ferre, J; Jamet, JP; Mougin, A; Zschornack, G,期刊:Journal Of Vacuum Science & Technology B, 页码:2162-2167 , 文章类型: Article,,卷期:2007年25-6]
- The aim of this article is to report on preliminary investigations in evaluating a new kind of focused ion beam (FIB) instrument realized by coupling an advanced FIB "nanowriter" with a compact electron beam ion trap. Th...
- Fabrication of zinc nanotip arrays by ion beam sputtering
[作者:Chao, LC; Liau, CC; Lee, JW; Tsai, FC,期刊:Journal Of Vacuum Science & Technology B, 页码:2168-2170 , 文章类型: Article,,卷期:2007年25-6]
- Zinc nanotip arrays were fabricated on polycrystalline zinc foils using capillaritron ion beam sputtering. The geometry and structure of the nanotip are found to be dependent on the ion species, beam energy, and exposure...
- Surface characterization of imprinted resist above glass transition temperature
[作者:Leveder, T; Landis, S; Davoust, L; Soulan, S; Tortai, JH; Chaix, N,期刊:Journal Of Vacuum Science & Technology B, 页码:2365-2369 , 文章类型: Article,,卷期:2007年25-6]
- Nanoimprint lithography is a high resolution and low cost patterning technique. Many difficulties have been overcome from the process point of view. This article is dedicated to the resist pattern characterization when t...
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