- Film-thickness dependence of 10 GHz Nb coplanar-waveguide resonators
[作者:Inomata, K; Yamamoto, T; Watanabe, M; Matsuba, K; Tsai, JS,期刊:Journal Of Vacuum Science & Technology B, 页码:2286-2291 , 文章类型: Article,,卷期:2009年27-5]
- The authors have studied Nb lambda/2 coplanar-waveguide (CPW) resonators whose resonant frequencies are 10-11 GHz. The resonators have different film thicknesses, t=0.05, 0.1, 0.2, and 0.3 mu m. They measured at low temp...
- Organopalladium catalyst on S-terminated GaAs(001)-(2x6) surface
[作者:Konishi, T; Toujyou, T; Ishikawa, T; Bell, GR; Tsukamotoa, S,期刊:Journal Of Vacuum Science & Technology B, 页码:2206-2208 , 文章类型: Article,,卷期:2009年27-5]
- Organopalladium molecules, such as Pd(CH3COO)(2) ({Pd}), immobilized on the S-terminated GaAs(001), termed GaAs-S-{Pd} have high catalytic activity and cycle durability in the Mizoroki-Heck reaction. It is thought that t...
- Comparison of conjugated polymer deposition techniques by photoluminescence spectroscopy
[作者:Lantz, KR; Pate, R; Stiff-Roberts, AD; Duffell, AG; Smith, ER; Everitt, HO,期刊:Journal Of Vacuum Science & Technology B, 页码:2227-2231 , 文章类型: Article,,卷期:2009年27-5]
- The effects of various deposition techniques on the photoluminescence spectra of the conjugated polymer poly[2-methoxy-5-(2'-ethylhexyloxy)-1,4-(1-cyanovinylene) phenylene] (MEH-CN-PPV) are investigated. Photoluminescenc...
- Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media
[作者:Tan, EL; Aung, KO; Sbiaa, R; Wong, SK; Tan, HK; Poh, WC; Piramanayagam, SN; Chum, CC,期刊:Journal Of Vacuum Science & Technology B, 页码:2259-2263 , 文章类型: Article,,卷期:2009年27-5]
- A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitc...
- Uniformity conditioning of diamond field emitter arrays
[作者:Jarvis, JD; Andrews, HL; Brau, CA; Choi, BK; Davidson, J; Kang, WP; Wong, YM,期刊:Journal Of Vacuum Science & Technology B, 页码:2264-2269 , 文章类型: Article,,卷期:2009年27-5]
- The authors present recent advances in the uniformity conditioning of diamond field emitter arrays (DFEAs). Postfabrication conditioning procedures consisting of thermal annealing and high field/current operation have be...
- Effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
[作者:Vos, I; Hellin, D; Vereecke, G; Pavel, E; Boullart, W; Vertommen, J,期刊:Journal Of Vacuum Science & Technology B, 页码:2301-2308 , 文章类型: Article,,卷期:2009年27-5]
- The benefits of integrating wet clean with plasma dry etch processes have been investigated. The studied applications included shallow trench isolation (STI), hardmask-based poly-silicon (poly-Si) gate, and nickel silici...
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