- Benchmarking of 50 nm features in thermal nanoimprint
[作者:Gourgon, C; Chaix, N; Schift, H; Tormen, M; Landis, S; Torres, CMS; Kristensen, A; Pedersen, RH; Christiansen, MB; Fernandez-Cuesta, I; Mendels, D; Montelius, L; Haatainen, T,期刊:Journal Of Vacuum Science & Technology B, 页码:2373-2378 , 文章类型: Article,,卷期:2007年25-6]
- The objective of this benchmarking is to establish a comparison of several tools and processes used in thermal NIL with Si stamps at the nanoscale among the authors' laboratories. The Si stamps have large arrays of 50 nm...
- Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight
[作者:Stuen, KO; In, I; Han, E; Streifer, JA; Hamers, RJ; Nealey, PF; Gopalan, P,期刊:Journal Of Vacuum Science & Technology B, 页码:1958-1962 , 文章类型: Article,,卷期:2007年25-6]
- The directed assembly of polystyrene-block-poly(methyl methacrylate) films using chemically nanopatterned polymer brush surfaces with various molecular weights was investigated. The brushes (3-10 nm in thickness) were ma...
- Fabrication of three-dimensional structures of resist by proton beam writing
[作者:Furuta, Y; Uchiya, N; Nishikawa, H; Haga, J; Sato, T; Oikawa, M; Ishii, Y; Kamiya, T,期刊:Journal Of Vacuum Science & Technology B, 页码:2171-2174 , 文章类型: Article,,卷期:2007年25-6]
- The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed ...
- Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists
[作者:Voisin, P; Zelsmann, M; Ridaoui, H; Chouiki, M; Gourgon, C; Boussey, J; Zahouily, K,期刊:Journal Of Vacuum Science & Technology B, 页码:2384-2387 , 文章类型: Article,,卷期:2007年25-6]
- This article reports on the properties of ultraviolet nanoimprint lithography dedicated imprinting materials. Studied solutions are composed of a diacrylate-based monomer and a variable amount (1%, 2%, and 4% in weight) ...
- Membrane folding by helium ion implantation for three-dimensional device fabrication
[作者:Arora, WJ; Sijbrandij, S; Stern, L; Notte, J; Smith, HI; Barbastathis, G,期刊:Journal Of Vacuum Science & Technology B, 页码:2184-2187 , 文章类型: Article,,卷期:2007年25-6]
- The authors demonstrate that silicon nitride membranes can be folded out of plane into three-dimensional structures by helium ion implantation. The folds have a radius of 1 mu m and can be directed both up or down by var...
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