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  • Epitaxial Graphene Growth by Carbon Molecular Beam Epitaxy (CMBE)
    [作者:Park, J; Mitchel, WC; Grazulis, L; Smith, HE; Eyink, KG; Boeckl, JJ; Tomich, DH; Pacley, SD; Hoelscher, JE,期刊:ADVANCED MATERIALS, 页码:4140-4140 , 文章类型: Article,,卷期:2010年22-37]
  • A novel growth method (carbon molecular beam epitaxy (CMBE)) has been developed to produce high-quality and large. area epitaxial graphene. This method demonstrates significantly improved controllability of the graphene ...
  • Silicon-Based Near-Visible Logpile Photonic Crystal
    [作者:Subramania, G; Lee, YJ; Fischer, AJ,期刊:ADVANCED MATERIALS, 页码:4180-4180 , 文章类型: Article,,卷期:2010年22-37]
  • A nanocavity structure is embedded inside a silicon logpile photonic crystal that demonstrates tunable absorption behavior at near visible wavelengths well beyond the absorption edge of silicon. This is due to silicon's ...