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  • Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks
    [作者:Brizuela, F; Carbajo, S; Sakdinawat, A; Alessi, D; Martz, DH; Wang, Y; Luther, B; Goldberg, KA; Mochi, I; Attwood, DT; La Fontaine, B; Rocca, JJ; Menoni, CS,期刊:OPTICS EXPRESS, 页码:14467-14473 , 文章类型: Article,,卷期:2010年18-14]
  • We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of ...
  • Low loss shallow-ridge silicon waveguides
    [作者:Dong, P; Qian, W; Liao, SR; Liang, H; Kung, CC; Feng, NN; Shafiiha, R; Fong, JA; Feng, DZ; Krishnamoorthy, AV; Asghari, M,期刊:OPTICS EXPRESS, 页码:14474-14479 , 文章类型: Article,,卷期:2010年18-14]
  • We demonstrate low loss shallow-ridge silicon waveguides with an average propagation loss of 0.274 +/- 0.008 dB/cm in the C-band (1530 nm - 1565 nm). These waveguides have a cross section of 0.25 mu m by 2 mu m and are f...
  • Theory of plasmonic Fabry-Perot nanolasers
    [作者:Chang, SW; Lin, TR; Chuang, SL,期刊:OPTICS EXPRESS, 页码:15039-15053 , 文章类型: Article,,卷期:2010年18-14]
  • Semiconductor plasmonic lasers at submicron and nanometer scales exhibit many characteristics distinct from those of their conventional counterparts at micron scales. The differences originate from their small sizes and ...
  • Design and properties of dielectric surface plasmon Bragg mirrors
    [作者:Randhawa, S; Gonzalez, MU; Renger, J; Enoch, S; Quidant, R,期刊:OPTICS EXPRESS, 页码:14496-14510 , 文章类型: Article,,卷期:2010年18-14]
  • The ability of gratings made of dielectric ridges placed on top of flat metal layers to open gaps in the dispersion relation of surface plasmon polaritons (SPPs) is studied, both experimentally and theoretically. The gap...
  • Fabrication of concave silicon micro-mirrors
    [作者:Ow, YS; Breese, MBH; Azimi, S,期刊:OPTICS EXPRESS, 页码:14511-14518 , 文章类型: Article,,卷期:2010年18-14]
  • We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 mu m to 100 mu m. The fabrication process involves standard photolithography followed by large area ion beam irradiati...
  • Highly birefringent microstructured fibers with enhanced sensitivity to hydrostatic pressure
    [作者:Martynkien, T; Statkiewicz-Barabach, G; Olszewski, J; Wojcik, J; Mergo, P; Geernaert, T; Sonnenfeld, C; Anuszkiewicz, A; Szczurowski, MK; Tarnowski, K; Makara, M; Skorupski, K; Klimek, J; Poturaj, K; Urbanczyk, W; Nasilowski, T; Berghmans, F; Thienpont, H,期刊:OPTICS EXPRESS, 页码:15113-15121 , 文章类型: Article,,卷期:2010年18-14]
  • We designed, manufactured and characterized two birefringent microstructured fibers that feature a 5-fold increase in polarimetric sensitivity to hydrostatic pressure compared to the earlier reported values for microstru...
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