- Process-simulation system for UV-nanoimprint lithography
[作者:Shibata, M; Horiba, A; Nagaoka, Y; Kawata, H; Yasuda, M; Hirai, Y,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M108-C6M113 , 文章类型: Article,,卷期:2010年28-6]
- Process-simulation systems for ultraviolet (UV) nanoimprint lithography are newly proposed to investigate process physics and resist profiles. The system consists of four modules, which simulate fluid dynamics in the res...
- Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography
[作者:Wang, Q; Hiroshima, H; Atobe, H; Youn, SW,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M125-C6M129 , 文章类型: Article,,卷期:2010年28-6]
- How to form a thin and uniform residual layer, which is difficult to be created for a feature with nonuniform pattern densities, is of critical importance in nanoimprint lithography since residual layer removal by a reac...
- Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications
[作者:Yu, ZN; Hwu, J; Liu, YD; Su, ZP; Yang, H; Wang, HY; Hu, W; Xu, YA; Kurataka, N; Hsu, YZ; Lee, SF; Gauzner, G,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M130-C6M135 , 文章类型: Article,,卷期:2010年28-6]
- The authors have applied spectroscopic ellipsometry optical critical dimension (SE-OCD) measurement to grating templates and imprinted resist patterns with a pitch of 72.6 nm, corresponding to a track density of 350 ktpi...
- Sputtering with an etch-free lift-off in thermal nanoimprint lithography
[作者:Mayer, A; Bogdanski, N; Mollenbeck, S; Dhima, K; Papenheim, M; Scheer, HC,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M136-C6M139 , 文章类型: Article,,卷期:2010年28-6]
- Two low-cost techniques suitable for large area processing are combined to define submicrometer metal structures, thermal nanoimprint lithography, and sputtering. With very low residual layers after thermal nanoimprint, ...
- Evaluation of oxygen inhibition for UV-curable resins by adhesion force measurement using scanning probe microscope
[作者:Okada, M; Iwasa, M; Miyake, H; Ohsaki, T; Haruyama, Y; Kanda, K; Matsui, S,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M17-C6M22 , 文章类型: Article,,卷期:2010年28-6]
- UV nanoimprint lithography is used to fabricate nanostructure devices with high throughput, low cost, and high resolution. UV-curable resins are one important factor in UV nanoimprinting and they are mainly categorized i...
- Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures
[作者:Kaspar, P; Jeyaram, Y; Jackel, H; Foelske, A; Kotz, R; Bellini, S,期刊:Journal Of Vacuum Science & Technology B, 页码:1179-1186 , 文章类型: Article,,卷期:2010年28-6]
- A cyclic approach to silicon nitride dry-etching is presented, which differs in concept from most established high aspect ratio etching processes. Alternating steps of CHF3 etching and oxygen plasma treatment are applied...
- Characterizations of nanoembossed Pb(Zr-0.3, Ti-0.7)O-3 ferroelectric films
[作者:Shen, ZK; Chen, ZH; Lu, QA; Jiang, AQ; Qiu, ZJ; Qu, XP; Chen, YF; Liu, R,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M28-C6M31 , 文章类型: Article,,卷期:2010年28-6]
- Ferroelectric thin films may find potential applications in a broad range of ferroelectronic devices such as mass-storage memories. In this article, arrays of Pb (Zr-0.3, Ti-0.7)O-3 (PZT) ferroelectric cells with minimum...
- Electrical properties of transferred metal nanopattern using metal oxide release layer
[作者:Unno, N; Taniguchi, J; Ide, S,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M32-C6M36 , 文章类型: Article,,卷期:2010年28-6]
- There is a growing demand for fine metal patterning techniques for the fabrication of next-generation devices such as patterned media, plasmon photonic devices, and nanoscale electrodes. Moreover, plastic substrate has b...
- Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography
[作者:Schleunitz, A; Spreu, C; Haatainen, T; Klukowska, A; Schift, H,期刊:Journal Of Vacuum Science & Technology B, 页码:C6M37-C6M40 , 文章类型: Article,,卷期:2010年28-6]
- A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold m...
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